hafnium carbide and hafnium diboride films oxidization

 hafnium carbide and hafnium diboride films oxidize in quite different ways at elevated temperatures. The carbide forms a fine-grained, compact protective interlayer that slows the diffusion of oxygen. In contrast, the diboride forms gaseous products at the interface, creating voids and easy oxygen access. The formation of the interlayer during the hafnium carbide oxidation also has the apparent benefit of matching materials together better, probably with respect to both interfacial chemical adhesion and coefficients of thermal expansion, such that they do not separate from one another during broad temperature excursions. 

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