Hafnium silicide is a kind of transition metal silicide, which is a kind of refractory intermetallic compound. Because of its unique physical and chemical properties, it has been successfully applied in complementary metal oxide semiconductor components, thin film coatings, bulk structural components, electric heating Components, thermoelectric materials and photovoltaic materials and other fields. Its nanomaterials show special electrical, optical, magnetic and thermoelectric properties, and even have potential application value in the field of catalysis. However, traditional preparation methods such as metallurgical methods or physical methods cannot satisfy the preparation of transition metal silicide nanomaterials. Therefore, finding a simple, controllable and universally applicable preparation method is of great significance for the wide application of transition metal silicide nanomaterials.
Application of hafnium disilicide:
1. Preparation of silicon carbide-hafnium silicide-tantalum silicide (SiC-HfSi2-
TaSi2) anti-ablation composite coating. Carbon fiber reinforced carbon (C/C) composite material is a new type of high temperature resistant composite material with carbon fiber as reinforcement and pyrolytic carbon as matrix. Because of its excellent high temperature strength, anti-ablation performance and good friction and wear performance, in the early 1970s, the United States carried out research work on C/C composite materials for thermal structures, making C/C composite materials change from burning heat-resistant materials to Development of thermal structural materials. C/C composite materials can be used as thermal structural materials for gas turbine engine structural components, nose cone caps of space shuttles, wing leading edges, etc. Most of these components work in high temperature and oxidative environments.
However, C/C composites are easy to oxidize, and usually cannot serve normally in an oxidizing atmosphere above 400 °C. This requires proper anti-oxidation protection for C/C composites, and the preparation of anti-oxidation coatings is one of the main protective measures. Studies have shown that when refractory metals Zr, Hf, Ta,
TiB2, etc. are added to the carbon matrix, the ablation resistance of C/C composites can be further improved. In order to understand the effect of metal Hf and Ta on the ablation performance of C/C composites, an experiment prepared SiC–HfSi2–TaSi2 anti-ablation coating by embedding method, and the anti-ablation coating was measured with an oxyacetylene ablation device. The ablative properties of the layer. Knot
2. Fabrication of an organic electroluminescent device. It includes an anode, a light-emitting layer, a cathode and an encapsulation cover stacked in sequence, and the encapsulation cover encapsulates the light-emitting layer and the cathode on the anode, and the encapsulation cover includes a silicon carbonitride layer and a barrier layer formed on the surface of the silicon carbonitride layer The material of the barrier layer includes silicide and metal oxide, the silicide is selected from at least one of chromium silicide, tantalum disilicide, hafnium silicide, titanium disilicide, molybdenum disilicide and tungsten disilicide, the The metal oxide is selected from at least one of magnesium oxide, aluminum oxide, titanium dioxide, zirconium oxide, hafnium oxide and tantalum pentoxide. The above-mentioned organic electroluminescent device has a long lifetime. The invention also provides a preparation method of the organic electroluminescence device.
3. Preparation of a silicon-germanium alloy-based thermoelectric element. The silicon-germanium alloy-based thermoelectric element is composed of an electrode layer, a silicon-germanium alloy-based thermoelectric layer, and a barrier layer between the electrode layer and the silicon-germanium alloy-based thermoelectric layer, the barrier layer is a mixture of silicide and silicon nitride, The silicide is at least one of molybdenum silicide, tungsten silicide, cobalt silicide, nickel silicide, niobium silicide, zirconium silicide, tantalum silicide, and hafnium silicide. The interfaces of the silicon-germanium alloy-based thermoelectric elements provided are well bonded, no cracks and obvious diffusion phenomena are found at the interfaces, the contact resistance is small, the thermal contact state is good, and it can withstand long-term high-temperature accelerated tests. In addition, the preparation method provided has the characteristics of simple process, high reliability, low cost, no need of special equipment, suitable for large-scale production and the like.
4. Preparation of a high temperature and oxidation resistant cermet composite coating. The composite thin film is characterized in that the coating is composed of refractory metal, refractory carbide and intermetallic compound, and the thickness of the coating is 10 μm to 50 μm. The refractory metal is one or more of molybdenum, tantalum, zirconium and hafnium; the refractory carbide is composed of silicon carbide, and one or more of tantalum carbide, zirconium carbide and hafnium carbide The composition of the intermetallic compound is one or more of molybdenum silicide, tantalum silicide,
zirconium silicide, hafnium silicide, tantalum carbon silicide, zirconium carbon silicide and hafnium silicide; the crystal structure of the coating is composed of non- Crystalline and/or polycrystalline nanoparticle composition.
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